低速高电荷态离子论文-薛迎利

低速高电荷态离子论文-薛迎利

导读:本文包含了低速高电荷态离子论文开题报告文献综述及选题提纲参考文献,主要关键词:毛细管

低速高电荷态离子论文文献综述

薛迎利[1](2011)在《利用锥形毛细管获取低速高电荷态离子微束(英文)》一文中研究指出With the extensive and wide application of the ion microbeam, production of microbeams with high current, various charge states, wider energy range and especially low cost is under urgent demands. Owing to the focusing effect[1, 2] of ions passing through a tapered glass capillary, it is practically available to produce a microbeam with a simple and low cost method. At present, microbeams have been produced with such a method, but they were limited to either several tens keV slow highly-charged ions (HCIs) (e.g. Ref.[2, 3] ) or several MeV (e.g. Ref,[1, 4] ) low charged states ions. Production of slow HCIs microbeams at several hundreds keV to several MeV, which has an extensive application prospect, is just beginning.(本文来源于《IMP & HIRFL Annual Report》期刊2011年00期)

张丽卿[2](2010)在《低速高电荷态离子对氮化镓外延膜辐照损伤的X射线光电子能谱研(英文)》一文中研究指出The potential of the wide band gap semiconductor GaN and related materials for the realization of novel optoelectronic devices has been well documented [1~3]. However,the inertness of III-nitrides to the majority of conventional wet etchants was a hindrance to overcome for fabrication of devices by chemical etching. The chemical inertness of GaN resulted in either virtually no reaction with etchants or slow etch rate on the order of tens of angstroms per minute. Therefore,efficient ways of etching GaN have been sought. Recently,we found slow highly char(本文来源于《IMP & HIRFL Annual Report》期刊2010年00期)

韩录会,张崇宏,张丽卿,杨义涛,宋银[3](2010)在《低速高电荷态重离子辐照的GaN晶体表面X射线光电子能谱研究》一文中研究指出利用低速高电荷态Xeq+和Pbq+离子对在蓝宝石衬底上生长的GaN晶体膜样品进行辐照,并利用X射线光电子能谱(XPS)对样品表面化学组成和元素化合态进行了分析.结果表明,高电荷态离子对样品表面有显着的刻蚀作用;经高电荷态离子辐照的GaN样品表面氮元素贫乏而镓元素富集;随着入射离子剂量和所携带电荷数的增大,Ga—Ga键相对含量增大;辐照后,GaN样品中Ga—Ga键对应的Ga3d5/2电子的束缚能偏小,晶格损伤使内层轨道电子束缚能向低端方向偏移.(本文来源于《物理学报》期刊2010年07期)

付云翀,姚存峰,金运范[4](2010)在《低速高电荷态重离子在C_(60)薄膜中引起的势效应研究》一文中研究指出为了研究低速高电荷态离子在C60薄膜中引起的势效应,用能量为200keV的高电荷态Xen+(n=3,10,13,15,17,20,22,23)离子辐照了C60薄膜。用原子力显微镜(AFM)和Raman散射技术分析了辐照过程中高电荷态Xen+离子所储存势能在C60薄膜中引起的效应,即势效应。AFM分析结果表明,辐照C60薄膜的表面粗糙度随辐照Xen+离子电荷态(即势能)的增加而减小,揭示了势效应的存在。而Raman分析结果表明,由于Xe离子的动能远大于其所储存的势能,因此,尽管有表面势效应的影响,但在Raman分析的深度范围内,弹性碰撞还是主导了C60薄膜的损伤过程。(本文来源于《原子核物理评论》期刊2010年02期)

张丽卿[5](2008)在《低速高电荷态离子蚀剂氮化镓表面的势能域值研究(英文)》一文中研究指出We investigate the erosion appearance on the surface of GaN crystals by impact of various slow highly charged ions(Arq+,Xeq+ and Pbq+). Atomic force microscopy reveals a surprisingly sharp and well-de(本文来源于《IMP & HIRFL Annual Report》期刊2008年00期)

李德慧,赵永涛,王瑜玉,赵迪,肖国青[6](2008)在《低速多电荷态离子He~(2+)、O~(2+)和Ne~(2+)与W靶表面相互作用的动能电子发射研究》一文中研究指出本文报道了He2+,O2+和Ne2+与W靶表面相互作用中的动能电子产额随离子入射速度变化的实验测量结果.结果表明:在本实验的入射速度范围内,对同一入射离子,动能电子产额随入射离子的速度增大而线性增加.基于动能电子发射的机理,我们分析了影响动能电子产额的因素,理论上得出动能电子产额与入射速度增长呈线性增加的关系,取得了实验上和理论上一致的结果.(本文来源于《原子与分子物理学报》期刊2008年04期)

王瑜玉[7](2007)在《低速高电荷态离子与表面作用形成的表面纳米结构研究(英文)》一文中研究指出The highly charged ions(HCIs)carry a large amount of potential energy.When they come into close- ly contact with solid surfaces,a state far from equilibrium is created(hollow atom/ion formation).As a consequence,a wide variety of electronic processes,which eventually will re-establish equilibrium,are ini-(本文来源于《IMP & HIRFL Annual Report》期刊2007年00期)

王瑜玉,A.Qayyum[8](2006)在《低速多电荷态离子在固体表面的电子发射产额(英文)》一文中研究指出Electron emission from solid surfaces by multi-charged ions is one of the most fundamental processes in ion-solid in- teractions and has received a great deal of attention recently. The total electron yieldγ,is usually defined as the number of electrons ejected per incident ions.γ,is commonly ascribed to the sum of the potential electron yieldγ_(PE)and the kinetic elec- tron yieldγ_(KE).The experimental studies on electron emission(本文来源于《IMP & HIRFL Annual Report》期刊2006年00期)

杨义涛[9](2006)在《低速高电荷态重离子在GaN单晶中引起的辐射照损伤研究(英文)》一文中研究指出Specimens of n-type GaN were irradiated with 180 keV Xe~(26+)in two geometries,ions incident close to the normal and at an angle 60°from normal of the specimen's surfaces.The fluences are 1×10~(14),1×10~(15), 1×10~(16)and 2×10~(16)ions/cm~2 for normal incidence,and 1×10~(14),1×10~(15)and 5×10~(15)ions/cm~2 for tilt inci- dence.For comparison,the experiment of GaN irradiated normally to the specimen's surfaces with 110 keV Mo~+ was also carried out.The fluences range from 2×10~(14)to 5×10~(16)ions/cm~2.Damage induced in(本文来源于《IMP & HIRFL Annual Report》期刊2006年00期)

张丽卿[10](2006)在《低速高电荷态Xe~(n+)离子辐照的氮化镓晶体表面改性的研究(英文)》一文中研究指出When slow highly charged heavy ions(SHCIs)approach solid surface,intense,ultra-fast electronic excitation and ionization occur due to the dissipation of the potential energy of SHCIs in only a few fs. There are increasing investigations of the interaction between SHCIs and solids,and of the potential appli- cation of SHCIs as novel techniques for material analysis and engineering.Gallium nitride(GaN)is receiv- ing more attention in recent years because of its outstanding properties suitable for the development of no-(本文来源于《IMP & HIRFL Annual Report》期刊2006年00期)

低速高电荷态离子论文开题报告

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The potential of the wide band gap semiconductor GaN and related materials for the realization of novel optoelectronic devices has been well documented [1~3]. However,the inertness of III-nitrides to the majority of conventional wet etchants was a hindrance to overcome for fabrication of devices by chemical etching. The chemical inertness of GaN resulted in either virtually no reaction with etchants or slow etch rate on the order of tens of angstroms per minute. Therefore,efficient ways of etching GaN have been sought. Recently,we found slow highly char

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低速高电荷态离子论文参考文献

[1].薛迎利.利用锥形毛细管获取低速高电荷态离子微束(英文)[J].IMP&HIRFLAnnualReport.2011

[2].张丽卿.低速高电荷态离子对氮化镓外延膜辐照损伤的X射线光电子能谱研(英文)[J].IMP&HIRFLAnnualReport.2010

[3].韩录会,张崇宏,张丽卿,杨义涛,宋银.低速高电荷态重离子辐照的GaN晶体表面X射线光电子能谱研究[J].物理学报.2010

[4].付云翀,姚存峰,金运范.低速高电荷态重离子在C_(60)薄膜中引起的势效应研究[J].原子核物理评论.2010

[5].张丽卿.低速高电荷态离子蚀剂氮化镓表面的势能域值研究(英文)[J].IMP&HIRFLAnnualReport.2008

[6].李德慧,赵永涛,王瑜玉,赵迪,肖国青.低速多电荷态离子He~(2+)、O~(2+)和Ne~(2+)与W靶表面相互作用的动能电子发射研究[J].原子与分子物理学报.2008

[7].王瑜玉.低速高电荷态离子与表面作用形成的表面纳米结构研究(英文)[J].IMP&HIRFLAnnualReport.2007

[8].王瑜玉,A.Qayyum.低速多电荷态离子在固体表面的电子发射产额(英文)[J].IMP&HIRFLAnnualReport.2006

[9].杨义涛.低速高电荷态重离子在GaN单晶中引起的辐射照损伤研究(英文)[J].IMP&HIRFLAnnualReport.2006

[10].张丽卿.低速高电荷态Xe~(n+)离子辐照的氮化镓晶体表面改性的研究(英文)[J].IMP&HIRFLAnnualReport.2006

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低速高电荷态离子论文-薛迎利
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